標題: | Quantum Well InAs/AlSb/GaSb Vertical Tunnel FET With HSQ Mechanical Support |
作者: | Zeng, Yuping Kuo, Chien-I Hsu, Chingyi Najmzadeh, Mohammad Sachid, Angada Kapadia, Rehan Yeung, Chunwing Chang, Edward Hu, Chenming Javey, Ali 交大名義發表 National Chiao Tung University |
關鍵字: | Heterojunction;nanofabrication;TCAD simulation;tunneling barrier;type III (broken gap) band alignment;vertical in-line tunnel FET |
公開日期: | 1-May-2015 |
摘要: | A type-III (broken gap) band alignment heterojunction vertical in-line InAs/AlSb/GaSb tunnel FET, including a 2-nm-thin AlSb tunneling barrier is demonstrated. The impact of overlap and underlap gate is studied experimentally and supported further by quasi-stationary 2-D TCAD Sentaurus device simulations. Hydrogen silsesquioxane is used as a novel mechanical support structure to suspend the 10-nm-thin InAs drain with enough undercut to be able to demonstrate an overlap gate architecture. The overlap gate InAs/AlSb/GaSb TFET shows an ON current density of 22 mu A/mu m(2) at V-GS = V-DS = 0.4 V and the subthreshold slope is 194 mV/decade at room temperature and 46 mV/decade at 100 K. |
URI: | http://dx.doi.org/10.1109/TNANO.2015.2419232 http://hdl.handle.net/11536/124841 |
ISSN: | 1536-125X |
DOI: | 10.1109/TNANO.2015.2419232 |
期刊: | IEEE TRANSACTIONS ON NANOTECHNOLOGY |
Volume: | 14 |
起始頁: | 580 |
結束頁: | 584 |
Appears in Collections: | Articles |