Improved Field Emission Characteristics with different Electrode Materials by forming process in a Quasi-planar Thin Film Field Emission Diode

doi:10.1149/1.3334806

標題:	Improved Field Emission Characteristics with different Electrode Materials by forming process in a Quasi-planar Thin Film Field Emission Diode
作者:	Chang, C. T. Hsu, Y. Y. Lin, K. C. Tsai, Wan-Lin Chien, Yun-Shan Juan, C. P. Lee, I. C. Yang, P. Y. Cheng, H. C. 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics
公開日期:	1-Jan-2010
摘要:	The essay was reported the different electrode materials in a quasi-planar thin film field emission diode by different forming process. The forming process causes an increased surface roughness of emitters or reduced the work function of the emitter and results in a higher field enhancement factor, which shows better field emission characteristics. The turn on voltage could from 15 V to 8 V and 6.5V with Co and Pd electrode at the emission current of 100 nA for samples.
URI:	http://dx.doi.org/10.1149/1.3334806 http://hdl.handle.net/11536/125166
ISBN:	978-1-56677-807-7
ISSN:	1938-5862
DOI:	10.1149/1.3334806
期刊:	STUDENT POSTERS (GENERAL) - 216TH ECS MEETING
Volume:	25
Issue:	33
起始頁:	175
結束頁:	183
Appears in Collections:	Conferences Paper