光罩資料處理系統

Abstract

光罩位處於晶圓製造的上游,近年由於製程上的突飛猛進,對IC 設計公司(Design house)而言,無論是光罩(mask)或者是晶圓(wafer)進案(tape-out)的成本日趨於重,如何保障光罩資料處理的正確性,減低人為的錯誤, 以及加快 IC設計公司對 cycle time的需求,都是本論文想探討的,本論文提出針對光罩資料處理的自動化系統,來快速檢驗客戶的進案,並加快光罩資料處理的時間,減低人為錯誤的發生(MO prevention),經系統實作後,從客戶進案效率有效改善,提高資料圖形處理總產量,未來光罩資料處理系統提供更多自動化的功能,期望能更減低資料處理時間,提升光罩品質,來達到Time-to-market期望.

Mask marking is located in the upper reaches of wafer fabrication. In recent years due to technology is more and more advance. For IC Design House the cost of mask and wafer is higher than ever. How to ensure the validity of mask data processing and reduce human error, as well as to improve mask data preparation cycle time, are in this paper would like to explore l. After system design and valuate, mask tape-out productivity improve significantly. Pattern convert job can gain more throughout. In the future, mask data preparation system will provide more automation function to reduce data processing time, improve mask quality to achieve time-to-market expirations.