標題: Evolution of conduction and interface states of laterally wet-oxidized AlGaAs with oxidation time
作者: Chen, JF
Hsiao, RS
Hung, WK
Wang, JS
Chi, JY
Yu, HC
Su, YK
電子物理學系
Department of Electrophysics
公開日期: 15-一月-2006
摘要: The conduction and interface states of laterally wet-oxidized GaAs-AlGaAs-GaAs structures after various oxidation times are investigated. Effective current blocking is achieved after 150 min oxidation and the conduction of current through the oxidized AlGaAs layer is controlled by the Poole-Frenkel mechanism, from which a relative dielectric constant of 7.07 is obtained. At an oxidation time of 15 min, capacitance-voltage spectra exhibit capacitance dispersion over frequency, implying the presence of an interface state. The intensity of the dispersion increases with increasing the oxidation time and admittance spectroscopy reveals a significant interface state at similar to 0.28 eV at 45 min. Further increasing the oxidation time to 150 min broadens the interface state to a set of continuous interface states from 0.19-0.31 eV with decreasing densities from 3x10(11) to 0.9x10(11) eV(-1) cm(-2) and generates fixed charges of about 9.1x10(11) cm(-2) in the oxidized layer. By comparison to a similar trap in a relaxed InGaAs/GaAs, the interface state is tentatively assigned to the interaction of residual As with dislocations. (c) 2006 American Institute of Physics.
URI: http://dx.doi.org/10.1063/1.2164532
http://hdl.handle.net/11536/12730
ISSN: 0021-8979
DOI: 10.1063/1.2164532
期刊: JOURNAL OF APPLIED PHYSICS
Volume: 99
Issue: 2
結束頁: 
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