超薄奈米切片技術製作一維奈米結構

Abstract

超薄切片機多用於穿透式電子顯微鏡(TEM)與掃描式電子顯微鏡(SEM)試片分析的前處理，搭配超音波震盪鑽石刀，切片最薄可切至厚度10 nm。本研究使用超薄奈米切片技術，搭配蒸鍍製程，製作複合金屬奈米線。對複合金屬奈米結構進行選擇性蝕刻，可不使用黃光微影製程，製得線寬達20 nm的金屬奈米線陣列。最後將陣列式金屬奈米結構用作催化劑，成長奈米線陣列。

Ultramicrotome has been used for the pretreatment of analysis specimens for transmission electron microscopy (TEM) and scanning electron microscopy (SEM). The thinnest slices can be cut to a thickness of 10 nm with ultra sonic oscillating diamond knife. In this study, we demonstrates the use of ultramicrotomy as a novel nanofabrication technique for generating multilayer metallic nanowire. An array of parallel-aligned metallic nanowires can be achieved by selectively removing the sacrificial layers with precisely controlled size to 20 nm without using photolithography process. Finally, the array of metal nanostructures was employed as a catalyst to grow nanowire arrays.