標題: | Characterization of programmed charge lateral distribution in a two-bit storage nitride flash memory cell by using a charge-pumping technique |
作者: | Gu, SH Wang, TH Lu, WP Ting, WC Ku, YHJ Lu, CY 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | charge pumping (CP);cycling stress;programmed charge distribution;two-bit storage nitride Flash cell |
公開日期: | 1-Jan-2006 |
摘要: | In this paper, we use a modified charge pumping technique to characterize the programmed charge lateral distribution in a hot electron program/hot hole erase, two-bit storage nitride Flash memory cell. The stored charge distribution of each bit over the source/drain junctions can be profiled separately. Our result shows that the second programmed bit has a broader stored charge distribution than the first programmed bit. The reason is that a large channel field exists under the first programmed bit during the second bit programming. Such a large field accelerates channel electrons and causes earlier electron injection into the nitride. In addition, we find that programmed charges spread further into the channel as program/erase cycle number increases. |
URI: | http://dx.doi.org/10.1109/TED.2005.860632 http://hdl.handle.net/11536/12776 |
ISSN: | 0018-9383 |
DOI: | 10.1109/TED.2005.860632 |
期刊: | IEEE TRANSACTIONS ON ELECTRON DEVICES |
Volume: | 53 |
Issue: | 1 |
起始頁: | 103 |
結束頁: | 108 |
Appears in Collections: | Articles |
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