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dc.contributor.authorChang, YAen_US
dc.contributor.authorChen, JRen_US
dc.contributor.authorKuo, HCen_US
dc.contributor.authorKuo, YKen_US
dc.contributor.authorWang, SCen_US
dc.date.accessioned2014-12-08T15:17:41Z-
dc.date.available2014-12-08T15:17:41Z-
dc.date.issued2006-01-01en_US
dc.identifier.issn0733-8724en_US
dc.identifier.urihttp://dx.doi.org/10.1109/JLT.2005.860156en_US
dc.identifier.urihttp://hdl.handle.net/11536/12831-
dc.description.abstractIn this study, the gain-carrier characteristics of In0.02Ga0.98As and InAlGaAs quantum wells (QWs) of variant In and Al compositions with an emission wavelength of 838 nm are theoretically investigated. More compressive strain, caused by higher In and Al compositions in InAlGaAs QW, is found to provide higher material gain, lower transparency carrier concentration, and transparency radiative current density over the temperature range of 25-95 degrees C. To improve the output characteristics and high-temperature performance of 850-nm verticalcavity surface-emitting laser (VCSEL), In(0.15)AI(0.08)Ga(0.77)As/ Al0.3Ga0.7As is utilized as the active region, and a high-bandgap 10-nm-thick Al-0.75 Ga0.25As electronic blocking layer is employed for the first time. The threshold current and slope efficiency of the VCSEL with A(10.7)SGa(0.25)As at 25 degrees C are 1.33 mA and 0.53 W/A, respectively. When this VCSEL is operated at an elevated temperature of 95 C, the increase in threshold current is less than 21 % and the decrease in slope efficiency is approximately 24.5%. A modulation bandwidth of 9.2 GHz biased at 4 mA is demonstrated.en_US
dc.language.isoen_USen_US
dc.subjectelectronic blocking layeren_US
dc.subjectgain modelingen_US
dc.subjectInAlGaAs/AlGaAsen_US
dc.subjectMOCVDen_US
dc.subjectsemiconductor lasersen_US
dc.subject850-nm VCSELen_US
dc.titleTheoretical and experimental analysis on InAlGaAs/AlGaAs active region of 850-nm vertical-cavity surface-emitting lasersen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/JLT.2005.860156en_US
dc.identifier.journalJOURNAL OF LIGHTWAVE TECHNOLOGYen_US
dc.citation.volume24en_US
dc.citation.issue1en_US
dc.citation.spage536en_US
dc.citation.epage543en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000235270600061-
dc.citation.woscount16-
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