標題: | Local structure study of GeMn recrystallization process by helium ion beam-induced epitaxial crystallization |
作者: | Chen, C. H. Niu, H. Lee, C. P. 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | Raman scattering;TEM;Ion beam induced epitaxial crystallization;Ion beam material modification |
公開日期: | 1-十一月-2015 |
摘要: | In this study, GeMn thin films were fabricated by implantation of Mn ions at room temperature. Post-annealing was performed using 2 MeV of He+ ion irradiation. The recrystallization phenomena of the GeMn thin films were analyzed by Raman scattering. High-resolution transmission electron microscopy was also used to characterize the recrystallization process before and after ion beam annealing. A structure phase transition-like behavior of the recrystallization process of GeMn thin films was observed in the Raman spectra. (C) 2015 Elsevier B.V. All rights reserved. |
URI: | http://dx.doi.org/10.1016/j.apsusc.2015.06.021 http://hdl.handle.net/11536/128389 |
ISSN: | 0169-4332 |
DOI: | 10.1016/j.apsusc.2015.06.021 |
期刊: | APPLIED SURFACE SCIENCE |
Volume: | 354 |
起始頁: | 120 |
結束頁: | 123 |
顯示於類別: | 期刊論文 |