Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Fu, Yu-Min | en_US |
dc.contributor.author | Liang, Yen-Ju | en_US |
dc.contributor.author | Cheng, Y. T. | en_US |
dc.contributor.author | Wu, Pu-Wei | en_US |
dc.date.accessioned | 2015-12-02T03:00:57Z | - |
dc.date.available | 2015-12-02T03:00:57Z | - |
dc.date.issued | 2014-01-01 | en_US |
dc.identifier.isbn | 978-1-4799-4726-3 | en_US |
dc.identifier.issn | en_US | |
dc.identifier.uri | http://hdl.handle.net/11536/128596 | - |
dc.description.abstract | Inkjet printing has been one of fascinating techniques for microfabrication owing to the characteristics of low manufacturing cost, low processing temperature, low material usage,. etc. [1, 2]. In this work, a Lift-off Printing (LoP) process combining conventional photolithography and inkjet printing processes is introduced to realize printed size-scalable silver microstructures with the line width of 5 up to 70 m and the resistivity of similar to 5.7 mu Omega.cm on a silicon substrate. In addition, an as-printed interdigitated capacitor with the electrode size and spacing of 10 mu m has been successfully demonstrated with a capacitance of 2.3 pF/mm(2)@10kHz. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Size Scaling of Printed Microstructures Using a Lift-off Printing (LoP) Process | en_US |
dc.type | Proceedings Paper | en_US |
dc.identifier.journal | 2014 9TH IEEE INTERNATIONAL CONFERENCE ON NANO/MICRO ENGINEERED AND MOLECULAR SYSTEMS (NEMS) | en_US |
dc.citation.spage | 530 | en_US |
dc.citation.epage | 531 | en_US |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000361044400119 | en_US |
dc.citation.woscount | 0 | en_US |
Appears in Collections: | Conferences Paper |