| 標題: | SEMICONDUCTOR DEVICE AND FORMATION THEREOF |
| 作者: | Chien Chao-Hsin Chung Cheng-Ting Chen Che-Wei |
| 公開日期: | 8-Oct-2015 |
| 摘要: | A semiconductor device and methods of formation are provided. The semiconductor device includes a first metal alloy over a first active region of a fin and a second metal alloy over a second active region of the fin. A conductive layer is over a channel region of the fin. A semiconductive layer is over the conductive layer. The conductive layer over the channel region suppresses current leakage and the semiconductive layer over the conductive layer reduces electro flux from a source to a drain, as compared to a channel region that does not have such a conductive layer or a semiconductive layer over a conductive layer. The semiconductor device having the first metal alloy as at least one of the source or drain requires a lower activation temperature than a semiconductor device that does not have a metal alloy as a source or a drain. |
| 官方說明文件#: | H01L029/78 H01L029/45 H01L029/51 H01L029/49 H01L021/285 H01L029/16 H01L029/417 H01L029/423 H01L021/02 H01L029/66 H01L029/06 |
| URI: | http://hdl.handle.net/11536/128695 |
| 專利國: | USA |
| 專利號碼: | 20150287819 |
| Appears in Collections: | Patents |
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