標題: | Potential of Enhancement Mode In0.65Ga0.35As/InAs/In0.65Ga0.35As HEMTs for Using in High-Speed and Low-Power Logic Applications |
作者: | Fatah, Faiz Aizad Lin, Yueh-Chin Lee, Tsung-Yun Yang, Kai-Chun Liu, Ren-Xuan Chan, Jing-Ray Hsu, Heng-Tung Miyamoto, Yasuyuki Chang, Edward Yi 材料科學與工程學系 照明與能源光電研究所 電子工程學系及電子研究所 Department of Materials Science and Engineering Institute of Lighting and Energy Photonics Department of Electronics Engineering and Institute of Electronics |
公開日期: | 1-Jan-2015 |
摘要: | In this study, a 60-nm enhancement-mode (E-mode) In0.65Ga0.35As/InAs/In0.65Ga0.35As high electron mobility transistor (HEMT) was developed, and its potential for use inhigh-speed and low-power logic applications was investigated. When the E-mode device was biased at a drain-source voltage of 0.5 V, it demonstrated a cutoff frequency of 169 GHz, drain-induced barrier lowering of 70 mV/V, minimum subthreshold swing of 67 mV/decade, and ION/IOFF ratio greater than 1.6 x 10(4). The high performance of the E-mode device is attributed to the use of a thin barrier layer along with Pt gate sinking technology. These results confirm that E-mode In0.65Ga0.35As/InAs/In0.65Ga0.35As HEMTs have great potential for use inhigh-speed and low-power logic applications. (C) 2015 The Electrochemical Society. All rights reserved. |
URI: | http://dx.doi.org/10.1149/2.0171512jss http://hdl.handle.net/11536/129447 |
ISSN: | 2162-8769 |
DOI: | 10.1149/2.0171512jss |
期刊: | ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY |
Issue: | 12 |
起始頁: | N157 |
結束頁: | N159 |
Appears in Collections: | Articles |