標題: Fabricating a n(+)-Ge contact with ultralow specific contact resistivity by introducing a PtGe alloy as a contact metal (vol 107, 113503, 2015)
作者: Hsu, C. C.
Chou, C. H.
Wang, S. Y.
Chi, W. C.
Chien, C. H.
Luo, G. L.
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
公開日期: 7-Dec-2015
摘要: 
URI: http://dx.doi.org/10.1063/1.4937124
http://hdl.handle.net/11536/129540
ISSN: 0003-6951
DOI: 10.1063/1.4937124
期刊: APPLIED PHYSICS LETTERS
Volume: 107
Issue: 23
Appears in Collections:Articles