完整後設資料紀錄
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dc.contributor.authorHuang, Yen-Junen_US
dc.contributor.authorHsieh, Yen-Huien_US
dc.contributor.authorShih, Jian-Yuen_US
dc.contributor.authorChen, Han-Chunen_US
dc.contributor.authorLeu, Jihperngen_US
dc.contributor.authorChen, Kuan-Nengen_US
dc.date.accessioned2017-04-21T06:55:30Z-
dc.date.available2017-04-21T06:55:30Z-
dc.date.issued2016-07en_US
dc.identifier.issn1533-4880en_US
dc.identifier.urihttp://dx.doi.org/10.1166/jnn.2016.12596en_US
dc.identifier.urihttp://hdl.handle.net/11536/132928-
dc.description.abstractThis study examines the metal/polymer interfacial adhesion strength for Cu, Ti and three polymers, BCB, SU-8 and AZ 4620. Detailed discussion and explanation focused on adhesion mechanism between metal and BCB, AZ 4620 dielectric are provided. The adhesion strengths of metal on polymer layer are measured by four point bending (FPB) test, which showed that copper and titanium have different characteristics in metal-polymer adhesion. Additionally, to figure out the interfacial adhesion mechanisms, X-ray photoelectron spectroscopy (XPS) technique is used to investigate the chemical bonding compositions between interfaces. The results indicate that the adhesion strength is enhanced by the intense reaction between metal and oxygen on the polymer main chain at the metal-polymer interfaces. On the other hand, interfacial adhesion strength is weaken owing to the destruction of polymer structure, thus the bonding between metal and polymer-main-chain debonded oxygen are of no effect on adhesion.en_US
dc.language.isoen_USen_US
dc.subjectAdhesionen_US
dc.subjectMetalen_US
dc.subjectPolymeren_US
dc.titleAdhesion Property Between Cu, Ti Metal and SU-8, AZ 4620 Polymer Dielectricen_US
dc.identifier.doi10.1166/jnn.2016.12596en_US
dc.identifier.journalJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGYen_US
dc.citation.volume16en_US
dc.citation.issue7en_US
dc.citation.spage7546en_US
dc.citation.epage7550en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子物理學系zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000387100400132en_US
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