標題: | Statistical Methodology to Identify Optimal Placement of On-Chip Process Monitors for Predicting Fmax |
作者: | Mu, Szu-Pang Chang, Wen-Hsiang Chao, Mango C. -T. Wang, Yi-Ming Chang, Ming-Tung Tsai, Min-Hsiu 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
公開日期: | 2016 |
摘要: | In previous literatures, many approaches use ring oscillators or other process monitors to correlate the chip\'s maximum operating frequency (F-max). But none of them focus on the placement of these on-chip process monitors (OPMs) on a chip. The placement will greatly influence the accuracy of a prediction model. In this paper, we first propose a simulation, framework to sample a chip\'s F-max and it\'s OPM result, These samples are used to develop our methodology of OPM placement and to verify the effectiveness of an OPM placement. Then, a model-fitting framework is presented to correlate the OPMs\' result to chip\'s F-max. Finally, we propose a methodology to idenify optimal placement of OPM for predicting F-max. The experiments demonstrate the effectiveness of our methodology in both simulation and silicon data. |
URI: | http://dx.doi.org/10.1145/2966986.2967076 http://hdl.handle.net/11536/134363 |
ISBN: | 978-1-4503-4466-1 |
ISSN: | 1933-7760 |
DOI: | 10.1145/2966986.2967076 |
期刊: | 2016 IEEE/ACM INTERNATIONAL CONFERENCE ON COMPUTER-AIDED DESIGN (ICCAD) |
Appears in Collections: | Conferences Paper |