標題: Statistical Methodology to Identify Optimal Placement of On-Chip Process Monitors for Predicting Fmax
作者: Mu, Szu-Pang
Chang, Wen-Hsiang
Chao, Mango C. -T.
Wang, Yi-Ming
Chang, Ming-Tung
Tsai, Min-Hsiu
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
公開日期: 2016
摘要: In previous literatures, many approaches use ring oscillators or other process monitors to correlate the chip\'s maximum operating frequency (F-max). But none of them focus on the placement of these on-chip process monitors (OPMs) on a chip. The placement will greatly influence the accuracy of a prediction model. In this paper, we first propose a simulation, framework to sample a chip\'s F-max and it\'s OPM result, These samples are used to develop our methodology of OPM placement and to verify the effectiveness of an OPM placement. Then, a model-fitting framework is presented to correlate the OPMs\' result to chip\'s F-max. Finally, we propose a methodology to idenify optimal placement of OPM for predicting F-max. The experiments demonstrate the effectiveness of our methodology in both simulation and silicon data.
URI: http://dx.doi.org/10.1145/2966986.2967076
http://hdl.handle.net/11536/134363
ISBN: 978-1-4503-4466-1
ISSN: 1933-7760
DOI: 10.1145/2966986.2967076
期刊: 2016 IEEE/ACM INTERNATIONAL CONFERENCE ON COMPUTER-AIDED DESIGN (ICCAD)
Appears in Collections:Conferences Paper