Study of low-temperature and post-stress hysteresis in high-k gate dielectrics

標題:	Study of low-temperature and post-stress hysteresis in high-k gate dielectrics
作者:	Wu, You-Lin Lin, Shi-Tin Yang, Chang Cheng Wu, Chien-Hung Chin, Albert 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics
公開日期:	2007
URI:	http://hdl.handle.net/11536/135140
ISBN:	978-1-4244-1891-6
期刊:	2007 INTERNATIONAL SEMICONDUCTOR DEVICE RESEARCH SYMPOSIUM, VOLS 1 AND 2
起始頁:	175
結束頁:	+
顯示於類別：	會議論文