| 標題: | Impacts of a buffer layer and hi-wafers on the performance of strained-channel NMOSFETs with SiN capping layer |
| 作者: | Tsai, Tzu-, I Lee, Yao-Jen Chen, King-Sheng Wang, Jeff Wan, Chia-Chen Hsueh, Fu-Kuo Lin, Horng-Chih Chao, Tien-Sheng Huang, Tiao-Yuan 物理研究所 電子工程學系及電子研究所 Institute of Physics Department of Electronics Engineering and Institute of Electronics |
| 公開日期: | 2007 |
| URI: | http://hdl.handle.net/11536/135142 |
| ISBN: | 978-1-4244-1891-6 |
| 期刊: | 2007 INTERNATIONAL SEMICONDUCTOR DEVICE RESEARCH SYMPOSIUM, VOLS 1 AND 2 |
| 起始頁: | 329 |
| 結束頁: | + |
| Appears in Collections: | Conferences Paper |
- 緩衝層與經氫氣回火矽晶圓對具氮化矽覆蓋層之形變N型金氧半場效電晶體之元件特性及可靠度之影響 / 蔡子儀;Tzu-I Tsai;黃調元;林鴻志;Tiao-Yuan Huan
- Impacts of a buffer layer and hydrogen-annealed wafers on the performance of strained-channel nMOSFETs with SiN-capping layer / Tsai, Tzu-I;Lin, Horng-Chih;Lee, Yao-Jen;Chen, King-Sheng;Wang, Jeff
- Reliability of strained-channel NMOSFETs with SiN capping layer on Hi-wafers with a thin LPCVD-TEOS buffer layer / Tsai, Tzu-, I;Lee, Yao-Jen;Chen, King-Sheng;Wang, Jeff;Wan, Chia-Chen
- Impacts of a polycrystalline-silicon buffer layer on the performance and reliability of strained n-channel metal-oxide-semiconductor field-effect transistors with SiN capping / Lu, Ching-Sen;Lin, Horng-Chih;Huang, Jian-Ming;Lee, Yao-Jen
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