標題: Local Strained Channel (LSC) nMOSFETs by different poly-Si gate and SiN capping layer thicknesses: Mobility enhancement, size dependence, and hot carrier stress
作者: Lee, Yao-Jen
Fan, Chia-Hao
Yang, Wen-Luh
Lin, Wen-Yan
Huang, Bohr-Ran
Chao, Tien-Sheng
Chuu, D. S.
物理研究所
Institute of Physics
公開日期: 2006
URI: http://hdl.handle.net/11536/135232
ISBN: 1-4244-0205-0
期刊: IPFA 2006: PROCEEDINGS OF THE 13TH INTERNATIONAL SYMPOSIUM ON THE PHYSICAL & FAILURE ANALYSIS OF INTEGRATED CIRCUITS
起始頁: 88
結束頁: +
Appears in Collections:Conferences Paper