Characteristics imrovement for flexible a-Si:H Thin Film Transistor with post treatment processes

標題:	Characteristics imrovement for flexible a-Si:H Thin Film Transistor with post treatment processes
作者:	Teng, Li-Feng Liu, Po-Tsun Chou, Yi-Teh Fan, Yang-Shun 光電工程學系顯示科技研究所 Department of Photonics Institute of Display
公開日期:	2010
摘要:	The performances of flexible a-Si:H TFTs on stainless foil with and without silicon nitride passivation layer were discussed in this study. The experiment results indicated the reliability of a-Si:H TFTs with passivation layer under mechanical strains was improved. That\'s related to the hydrogen passivating effect during deposition and post-annealing process.
URI:	http://hdl.handle.net/11536/135585
ISSN:	1883-2490
期刊:	IDW'10: PROCEEDINGS OF THE 17TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3
起始頁:	2207
結束頁:	2209
Appears in Collections:	Conferences Paper