標題: Failure Analysis of Gate-all-around Nanowire Field Effect Transistor Under TLP Test
作者: Zhang, Guoyan
Dong, Aihua
Liu, Nie
Tian, Rui
Yang, Xuejiao
Liu, Zhiwei
Lee, Kohui
Lin, Horng-Chih
Liou, Juin J.
Wang Yuxin
交大名義發表
National Chiao Tung University
關鍵字: Electrostatic discharge (ESD);TLP;Nanowire FET;Failure analysis
公開日期: 2014
摘要: Electrostatic discharge (ESD) characters of Nanowire Field Effect Transistors have been tested and analyzed in detail in this paper. TLP (transmission line pulsing technique) and semiconductor characterization system have been used for experiments. The failure currents and leakage currents of Nanowire Field Effect Transistor are characterized. Also, physical insights and failure model are provided to analyze the failure mechanism.
URI: http://hdl.handle.net/11536/135878
ISBN: 978-1-4799-2334-2
期刊: 2014 IEEE INTERNATIONAL CONFERENCE ON ELECTRON DEVICES AND SOLID-STATE CIRCUITS (EDSSC)
顯示於類別:會議論文