標題: | Failure Analysis of Gate-all-around Nanowire Field Effect Transistor Under TLP Test |
作者: | Zhang, Guoyan Dong, Aihua Liu, Nie Tian, Rui Yang, Xuejiao Liu, Zhiwei Lee, Kohui Lin, Horng-Chih Liou, Juin J. Wang Yuxin 交大名義發表 National Chiao Tung University |
關鍵字: | Electrostatic discharge (ESD);TLP;Nanowire FET;Failure analysis |
公開日期: | 2014 |
摘要: | Electrostatic discharge (ESD) characters of Nanowire Field Effect Transistors have been tested and analyzed in detail in this paper. TLP (transmission line pulsing technique) and semiconductor characterization system have been used for experiments. The failure currents and leakage currents of Nanowire Field Effect Transistor are characterized. Also, physical insights and failure model are provided to analyze the failure mechanism. |
URI: | http://hdl.handle.net/11536/135878 |
ISBN: | 978-1-4799-2334-2 |
期刊: | 2014 IEEE INTERNATIONAL CONFERENCE ON ELECTRON DEVICES AND SOLID-STATE CIRCUITS (EDSSC) |
顯示於類別: | 會議論文 |