標題: | Fabrication of arrays of (100) Cu under-bump-metallization for 3D IC packaging |
作者: | Chiu, Wei-Lan Lu, Chia-Ling Lin, Han-Wen Liu, Chien-Min Huang, Yi-Sa Lu, Tien-Lin Liu, Tao-Chi Hsiao, Hsiang-Yao Chen, Chih Kuo, Jui-Chao Tu, King-Ning 材料科學與工程學系 Department of Materials Science and Engineering |
關鍵字: | < 100 >-oriented Cu;nanotwinned copper;abnormal grain growth |
公開日期: | 2015 |
摘要: | Due to the thousands of microbumps on a chip for 3D ICs, the precise control of the microstructure of all the material is required. The nearly < 111 >-oriented nanotwinned and fine-grained Cu was electroplated on a Si wafer surface and annealed at 400-500 C for 1 h, many extremely large < 100 > oriented Cu crystals with grain sizes ranging from 200 to 400 um were obtained. The < 111 >-oriented Cu grains were transformed into super-large < 100 >-oriented grains after the annealing. In addition, we patterned the < 111 >-oriented Cu films into pad arrays of 25 to 100 um in diameter and annealed the nanotwinned Cu pads with same conditions. An array of < 100 >-oriented single crystals Cu pads can be obtained. Otherwise, single-crystal nano wire growth displays a process by one-dimensional anisotropic growth, in which the growth along the axial direction is much faster than in the radial direction. This study reported here a bulk-type two-dimensional crystal growth of an array of numerous < 100 >-oriented single crystals of Cu on Si. The growth process in 3D IC has the potential for microbump applications packaging technology. |
URI: | http://hdl.handle.net/11536/136049 |
ISBN: | 978-4-9040-9013-8 |
期刊: | 2015 INTERNATIONAL CONFERENCE ON ELECTRONIC PACKAGING AND IMAPS ALL ASIA CONFERENCE (ICEP-IAAC) |
起始頁: | 518 |
結束頁: | 522 |
顯示於類別: | 會議論文 |