標題: | Active ESD Protection for Input Transistors in a 40-nm CMOS Process |
作者: | Altolaguirre, Federico A. Ker, Ming-Dou 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | ESD;CMOS ICs;ESD protection;Reliability |
公開日期: | 2015 |
摘要: | This work presents a novel design for input ESD protection. By replacing the protection resistor with an active switch that isolates the input transistors from the pad under ESD stress, the ESD robustness can be greatly improved. The proposed designs were designed and verified in a 40-nm CMOS process using only thin oxide devices, which can successfully pass the typical industry ESD-protection specifications of 2-kV HBM and 200-V MM ESD tests. |
URI: | http://hdl.handle.net/11536/136067 |
ISBN: | 978-1-4799-6275-4 |
期刊: | 2015 International symposium on VLSI Design, Automation and Test (VLSI-DAT) |
Appears in Collections: | Conferences Paper |