標題: Active ESD Protection for Input Transistors in a 40-nm CMOS Process
作者: Altolaguirre, Federico A.
Ker, Ming-Dou
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: ESD;CMOS ICs;ESD protection;Reliability
公開日期: 2015
摘要: This work presents a novel design for input ESD protection. By replacing the protection resistor with an active switch that isolates the input transistors from the pad under ESD stress, the ESD robustness can be greatly improved. The proposed designs were designed and verified in a 40-nm CMOS process using only thin oxide devices, which can successfully pass the typical industry ESD-protection specifications of 2-kV HBM and 200-V MM ESD tests.
URI: http://hdl.handle.net/11536/136067
ISBN: 978-1-4799-6275-4
期刊: 2015 International symposium on VLSI Design, Automation and Test (VLSI-DAT)
顯示於類別:會議論文