標題: | Selective deposition of gold nanoparticles on SiO(2)/Si nanowires for molecule detection |
作者: | Sheu, JT Chen, CC Huang, PC Lee, YK Hsu, ML 材料科學與工程學系奈米科技碩博班 應用化學系 Graduate Program of Nanotechnology , Department of Materials Science and Engineering Department of Applied Chemistry |
關鍵字: | silicon nanowires;gold nanoparticles;AEAPTMS;scanning probe lithography;TMAH wet etching |
公開日期: | 1-四月-2005 |
摘要: | The selective deposition of gold nanoparticles on the surface of N-(2-Aminoethyl)-3-aminopropyl-trimethoxysilane (AEAPTMS)-pretreated silicon nanowire (SiNW)s for molecule detection was demonstrated. The SiNWs were fabricated by scanning probe lithography (SPL) and tetramethyl ammonium hydroxide (TMAH) wet etching. The width and height of the SiNWs were 60 nm and 10 nm, respectively. The gold nanoparticles were synthesized by the chemical reduction method. The electronic properties of the SiNWs in response to the binding of different molecules on the surface of the SiNWs subsequently were discussed. A dynamic observation of the change in conductance was conducted to monitor the reaction between gold nanoparticles and the AEAPTMS-pretreated surface of the SiNWs. The reaction of gold nanoparticles on the surface of the SiNWs took about 750 s before conductance saturation. Finally, an engineered enzyme, KSI-126C, with a thiol terminal was designed to bind with the gold nanoparticles on the surface of the SiNWs. Shifts in turn-on voltage in I-V(ds) characteristics have clearly been observed after the binding of molecules and gold nanoparticles. |
URI: | http://dx.doi.org/10.1143/JJAP.44.2864 http://hdl.handle.net/11536/13850 |
ISSN: | 0021-4922 |
DOI: | 10.1143/JJAP.44.2864 |
期刊: | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS |
Volume: | 44 |
Issue: | 4B |
起始頁: | 2864 |
結束頁: | 2867 |
顯示於類別: | 期刊論文 |