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dc.contributor.authorHsueh, THen_US
dc.contributor.authorHuang, HWen_US
dc.contributor.authorLai, FIen_US
dc.contributor.authorSheu, JKen_US
dc.contributor.authorChang, YHen_US
dc.contributor.authorKuo, HCen_US
dc.contributor.authorWang, SCen_US
dc.date.accessioned2014-12-08T15:19:28Z-
dc.date.available2014-12-08T15:19:28Z-
dc.date.issued2005-04-01en_US
dc.identifier.issn0957-4484en_US
dc.identifier.urihttp://dx.doi.org/10.1088/0957-4484/16/4/020en_US
dc.identifier.urihttp://hdl.handle.net/11536/13871-
dc.description.abstractThe fabrication of ln(0.3)Ga(0.7)N/GaN multiple-quantum-well nanorods with diameters of 60-100 nm and their optical characteristics performed by micro-photoluminescence measurements are presented. The nanorods were fabricated by inductively coupled plasma dry etching from a light-emitting diode wafer. The structure and surface properties of fabricated nanorods were verified by the field emission scanning electron microscopy and the transmission electron microscopy. The photoluminescence (PL) spectra with sharp linewidths of typically 1.5 nm were observed at 4 K. The excitation-power-dependent spectra show that no energy shift was observed for these sharp peaks. Moreover, increasing the excitation power instead leads to an occurrence of new, sharp PL peaks at the higher energy tail of the PL spectra, which suggest that excitons are strongly confined in quantum-dot-like regions or localization centres.en_US
dc.language.isoen_USen_US
dc.titlePhotoluminescence from In0.3Ga0.7N/GaN multiple-quantum-well nanorodsen_US
dc.typeArticleen_US
dc.identifier.doi10.1088/0957-4484/16/4/020en_US
dc.identifier.journalNANOTECHNOLOGYen_US
dc.citation.volume16en_US
dc.citation.issue4en_US
dc.citation.spage448en_US
dc.citation.epage450en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000228949300029-
dc.citation.woscount5-
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