標題: A novel program-erasable high-(K) A1N-Si MIS capacitor
作者: Lai, CH
Chin, A
Hung, BF
Cheng, CF
Yoo, WJ
Li, MF
Zhu, CX
McAlister, SP
Kwong, DL
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: capacitor;erase;high-K;program
公開日期: 1-Mar-2005
摘要: We demonstrate a programmable-erasable MIS capacitor with a single layer high-kappa AIN dielectric on Si having a high capacitance density of 5 fF/mum(2). It has low program and erase voltages of +4 and -4 V, respectively. Such an erase function is not available in other single layer Al2O3, AION, or other known high-kappa dielectric capacitors, where the threshold voltage (T h) shifts continuously with voltage. This device exhibits good data retention with a V-th change of only 0.06 V after 10 000 s.
URI: http://dx.doi.org/10.1109/LED.2004.842100
http://hdl.handle.net/11536/13954
ISSN: 0741-3106
DOI: 10.1109/LED.2004.842100
期刊: IEEE ELECTRON DEVICE LETTERS
Volume: 26
Issue: 3
起始頁: 148
結束頁: 150
Appears in Collections:Articles


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