Title: 背通道蝕刻型氧化銦鎢鋅薄膜電晶體技術之研究
Study on Back-Channel Etched of In-W-Zn-O Thin Film Transistors Technology
Authors: 張維晟
劉柏村
謝漢萍
Chang Wei-Cheng
Liu, Po-Tsun
Shieh, Han-Ping
光電工程研究所
Keywords: 薄膜電晶體;背通道蝕刻;氧化銦鎢鋅;thin film transister;back channel etched;IWZO
Issue Date: 2016
URI: http://etd.lib.nctu.edu.tw/cdrfb3/record/nctu/#GT070350565
http://hdl.handle.net/11536/139794
Appears in Collections:Thesis