| 標題: | 對稱式低金屬污染鎳金屬側向誘發結晶複晶矽薄膜電晶體之研究 Investigation on Symmetrical Ni Induced Lateral Crystallization Poly-Si TFTs with Low Metal Contaminations |
| 作者: | 王基琳 劉柏村 Wang, Ji-Lin Liu, Po-Tsun 光電工程研究所 |
| 關鍵字: | 複晶矽薄膜電晶體;金屬誘發結晶;低污染;對稱式;poly-Si thin film transistors;Ni induced lateral crystallization;low metal contaminations;symmectrical |
| 公開日期: | 2017 |
| URI: | http://etd.lib.nctu.edu.tw/cdrfb3/record/nctu/#GT070450552 http://hdl.handle.net/11536/142050 |
| 顯示於類別： | 畢業論文 |
- 鎳金屬誘發非晶矽薄膜側向結晶－成長機制、金屬捉聚與低溫複晶矽薄膜電晶體效能之研究 / 胡晟民;吳耀銓
- Improving the electrical properties of NILC poly-Si films using a gettering substrate / Hu, Chen-Ming;Wu, YewChung Sermon;Lin, Chi-Ching
- Improved Electrical Performance and Uniformity of MILC Poly-Si TFTs Manufactured Using Drive-In Nickel-Induced Lateral Crystallization / Chang, Chih-Pang;Wu, YewChung Sermon
- 高性能低溫多晶矽薄膜電晶體製作與特性之研究 / 林敬偉;Ching-Wei Lin;鄭晃忠;Huang-Chung Cheng
- Improved electrical characteristics and reliability of MILC poly-Si TFTs using fluorine-ion implantation / Chang, Chih-Pang;Wu, YewChung Sermon
Loading...