| 標題: | 以射頻磁控濺鍍氣相沉積法製備參氫的氧化銦薄膜 The fabrication and characterization of hydrogen doped indium oxide by RF-sputter method |
| 作者: | 王義智 吳耀銓 Wang,Yi-Chih Wu, Yew-Chung 工學院半導體材料與製程設備學程 |
| 關鍵字: | 以射頻磁控濺鍍氣相沉積法製備參氫的氧化銦薄膜;The fabrication and characterization of hydrogen doped indium oxide by RF-sputter method |
| 公開日期: | 2016 |
| URI: | http://etd.lib.nctu.edu.tw/cdrfb3/record/nctu/#GT070161324 http://hdl.handle.net/11536/143305 |
| 顯示於類別： | 畢業論文 |
- Transparent conductive indium-doped zinc oxide films prepared by atmospheric pressure plasma jet / Chang, Kow-Ming;Huang, Sung-Hung;Wu, Chin-Jyi;Lin, Wei-Li;Chen, Wei-Chiang
- 利用銦-錫氧化物(ITO)廢料回收高純度銦材 / 廖筱媛;Shiau-Yuan Liau;朝春光;劉增豐;C.G.Chao
- Effects of sputtering pressure and Al buffer layer thickness on properties of AZO films grown by rf magnetron sputtering / Tseng, C. H.;Wang, W. H.;Chang, H. C.;Chou, C. P.;Hsu, C. Y.
- 直流二極濺鍍銦鎵鋅氧化物薄膜電晶體技術開發研究 / 吳彥佑;Wu, Yen-Yu;劉柏村;Liu, Po-Tsun
- The electrochemical behavior of tin-doped indium oxide during reduction in 0.3 M hydrochloric acid / Huang, CA;Li, KC;Tu, GC;Wang, WS
Loading...