標題: 以射頻磁控濺鍍氣相沉積法製備參氫的氧化銦薄膜
The fabrication and characterization of hydrogen doped indium oxide by RF-sputter method
作者: 王義智
吳耀銓
Wang,Yi-Chih
Wu, Yew-Chung
工學院半導體材料與製程設備學程
關鍵字: 以射頻磁控濺鍍氣相沉積法製備參氫的氧化銦薄膜;The fabrication and characterization of hydrogen doped indium oxide by RF-sputter method
公開日期: 2016
URI: http://etd.lib.nctu.edu.tw/cdrfb3/record/nctu/#GT070161324
http://hdl.handle.net/11536/143305
Appears in Collections:Thesis