标题: | On the Hole Injection for III-Nitride Based Deep Ultraviolet Light-Emitting Diodes |
作者: | Li, Luping Zhang, Yonghui Xu, Shu Bi, Wengang Zhang, Zi-Hui Kuo, Hao-Chung 光电工程学系 光电工程研究所 Department of Photonics Institute of EO Enginerring |
关键字: | III-nitride semiconductor;multiple quantum well;light-emitting diode;hole injection efficiency;external quantum efficiency;internal quantum efficiency |
公开日期: | 1-十月-2017 |
摘要: | The hole injection is one of the bottlenecks that strongly hinder the quantum efficiency and the optical power for deep ultraviolet light-emitting diodes (DUV LEDs) with the emission wavelength smaller than 360 nm. The hole injection efficiency for DUV LEDs is co-affected by the p-type ohmic contact, the p-type hole injection layer, the p-type electron blocking layer and the multiple quantum wells. In this report, we review a large diversity of advances that are currently adopted to increase the hole injection efficiency for DUV LEDs. Moreover, by disclosing the underlying device physics, the design strategies that we can follow have also been suggested to improve the hole injection for DUV LEDs. |
URI: | http://dx.doi.org/10.3390/ma10101221 http://hdl.handle.net/11536/144043 |
ISSN: | 1996-1944 |
DOI: | 10.3390/ma10101221 |
期刊: | MATERIALS |
Volume: | 10 |
Issue: | 10 |
起始页: | 0 |
结束页: | 0 |
显示于类别: | Articles |
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