標題: Short-Channel Effects in 2D Negative-Capacitance Field-Effect Transistors
作者: You, Wei-Xiang
Tsai, Chih-Peng
Su, Pin
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: 2D semiconductors;ferroelectric FET;high-k gate dielectrics;Landau-Khalatnikov(L-K) equation;negative-capacitance field-effect transistor (NCFET);short-channel effects;subthreshold model;transition-metal-dichalcogenide (TMD)
公開日期: 1-Apr-2018
摘要: Through numerical simulations corroborated by an analytical subthreshold model considering drain coupling, this paper systematically investigates the short-channel effects in negative-capacitance FETs with 2D MoS2 channel (2D-NCFET). Our study indicates that, due to the impact of drain coupling on the negative-capacitance effect, the 2D-NCFET exhibits distinct short-channel behaviors such as improved average subthreshold swing and threshold-voltage roll-up with decreasing gate length. In addition, the fringe field through the high-k interlayer dielectric can significantly alter the subthreshold characteristics of the short-channel 2D-NCFET, and henceneeds to be carefully taken into account. Our studymay provide insights for device design using negative-capacitance FETs.
URI: http://dx.doi.org/10.1109/TED.2018.2805716
http://hdl.handle.net/11536/144702
ISSN: 0018-9383
DOI: 10.1109/TED.2018.2805716
期刊: IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume: 65
起始頁: 1604
結束頁: 1610
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