標題: | Short-Channel Effects in 2D Negative-Capacitance Field-Effect Transistors |
作者: | You, Wei-Xiang Tsai, Chih-Peng Su, Pin 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | 2D semiconductors;ferroelectric FET;high-k gate dielectrics;Landau-Khalatnikov(L-K) equation;negative-capacitance field-effect transistor (NCFET);short-channel effects;subthreshold model;transition-metal-dichalcogenide (TMD) |
公開日期: | 1-四月-2018 |
摘要: | Through numerical simulations corroborated by an analytical subthreshold model considering drain coupling, this paper systematically investigates the short-channel effects in negative-capacitance FETs with 2D MoS2 channel (2D-NCFET). Our study indicates that, due to the impact of drain coupling on the negative-capacitance effect, the 2D-NCFET exhibits distinct short-channel behaviors such as improved average subthreshold swing and threshold-voltage roll-up with decreasing gate length. In addition, the fringe field through the high-k interlayer dielectric can significantly alter the subthreshold characteristics of the short-channel 2D-NCFET, and henceneeds to be carefully taken into account. Our studymay provide insights for device design using negative-capacitance FETs. |
URI: | http://dx.doi.org/10.1109/TED.2018.2805716 http://hdl.handle.net/11536/144702 |
ISSN: | 0018-9383 |
DOI: | 10.1109/TED.2018.2805716 |
期刊: | IEEE TRANSACTIONS ON ELECTRON DEVICES |
Volume: | 65 |
起始頁: | 1604 |
結束頁: | 1610 |
顯示於類別: | 期刊論文 |