標題: Temperature effect on the growth of Au-free InAs and InAs/GaSb heterostructure nanowires on Si substrate by MOCVD
作者: Kakkerla, Ramesh Kumar
Anandan, Deepak
Hsiao, Chih-Jen
Yu, Hung Wei
Singh, Sankalp Kumar
Chang, Edward Yi
材料科學與工程學系
電子工程學系及電子研究所
Department of Materials Science and Engineering
Department of Electronics Engineering and Institute of Electronics
關鍵字: Interfaces;Metal organic chemical vapor deposition;Nanomaterials;Antimonides;Semiconducting III-V materials;Heterojunction semiconductor devices
公開日期: 15-五月-2018
摘要: We demonstrate the growth of vertically aligned Au-free InAs and InAs/GaSb heterostructure nanowires on Si (1 1 1) substrate by Metal Organic Chemical Vapor Deposition (MOCVD). The effect of growth temperature on the morphology and growth rate of the InAs and InAs/GaSb heterostructure nanowires (NWs) is investigated. Control over diameter and length of the InAs NWs and the GaSb shell thickness was achieved by using growth temperature. As the GaSb growth temperature increase, GaSb radial growth rate increases due to the increase in alkyl decomposition at the substrate surface. Diffusivity of the adatoms increases as the GaSb growth temperature increase which results in tapered GaSb shell growth. Scanning Electron Microscope (SEM) and Transmission Electron Microscope (TEM) measurements revealed that the morphology and shell thickness can be tuned by the growth temperature. Electron microscopy also shows the formation of GaSb both in radial and axial directions outside the InAs NW core can be controlled by the growth temperature. This study demonstrates the control over InAs NWs growth and the GaSb shell thickness can be achieved through proper growth temperature control, such technique is essential for the growth of nanowire for future nano electronic devices, such as Tunnel FET. (C) 2018 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.jcrysgro.2018.03.007
http://hdl.handle.net/11536/144795
ISSN: 0022-0248
DOI: 10.1016/j.jcrysgro.2018.03.007
期刊: JOURNAL OF CRYSTAL GROWTH
Volume: 490
起始頁: 19
結束頁: 24
顯示於類別:期刊論文