Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Chang, Po-Chun | en_US |
dc.contributor.author | Hsiao, Chih-Jen | en_US |
dc.contributor.author | Lumbantoruan, Franky Juanda | en_US |
dc.contributor.author | Wu, Chia-Hsun | en_US |
dc.contributor.author | Lin, Yen-Ku | en_US |
dc.contributor.author | Lin, Yueh-Chin | en_US |
dc.contributor.author | Sze, Simon M. | en_US |
dc.contributor.author | Chang, Edward Yi | en_US |
dc.date.accessioned | 2019-04-02T05:58:40Z | - |
dc.date.available | 2019-04-02T05:58:40Z | - |
dc.date.issued | 2018-01-01 | en_US |
dc.identifier.issn | 2168-6734 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1109/JEDS.2018.2859811 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/147994 | - |
dc.description.abstract | In this paper, the InGaAs junctionless (JL) FinFET with notable electrical performance is demonstrated. The device with W-fin down to 20 nm, EOT of 2.1 nm, and L-G = 60 nm shows high I-ON = 188 mu A/mu m at V-DD = 0.5 V and I-OFF = 100 nA/mu m, I-ON/I-OFF = 5 x 10(5), DIBL = 106 mV/V and SS = 96 mV/dec. The device also exhibits a decent extrinsic transconductance (G(m)) of 1142 mu S/mu m at V-DS of 0.5 V. This high performance is attributed to the moderate doping concentration to ensure the channel carriers could be effectively depleted and the low R-SD realized by self-aligned Ni-InGaAs alloy S/D. Furthermore, we also examine the temperature dependence of the main electrical parameters of the JL transistor. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | Junctionless (JL) transistor | en_US |
dc.subject | InGaAs nMOSFETs | en_US |
dc.subject | FinFET | en_US |
dc.subject | high-k dielectric | en_US |
dc.subject | Ni-InGaAs | en_US |
dc.subject | metal source/drain | en_US |
dc.title | InGaAs Junctionless FinFETs With Self-Aligned Ni-InGaAs S/D | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1109/JEDS.2018.2859811 | en_US |
dc.identifier.journal | IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY | en_US |
dc.citation.volume | 6 | en_US |
dc.citation.spage | 856 | en_US |
dc.citation.epage | 860 | en_US |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000441422600004 | en_US |
dc.citation.woscount | 0 | en_US |
Appears in Collections: | Articles |