完整後設資料紀錄
DC 欄位語言
dc.contributor.authorJin, Yamingen_US
dc.contributor.authorXiao, Shuyuen_US
dc.contributor.authorYang, Jan-Chien_US
dc.contributor.authorZhang, Juntingen_US
dc.contributor.authorLu, Xiaomeien_US
dc.contributor.authorChu, Ying-Haoen_US
dc.contributor.authorCheong, S. -W.en_US
dc.contributor.authorLi, Jiangyuen_US
dc.contributor.authorKan, Yien_US
dc.contributor.authorYue, Chenen_US
dc.contributor.authorLi, Yangen_US
dc.contributor.authorJu, Changchengen_US
dc.contributor.authorHuang, Fengzhenen_US
dc.contributor.authorZhu, Jinsongen_US
dc.date.accessioned2019-04-02T05:58:38Z-
dc.date.available2019-04-02T05:58:38Z-
dc.date.issued2018-08-20en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.5045721en_US
dc.identifier.urihttp://hdl.handle.net/11536/148048-
dc.description.abstractThe complex conductive behavior of ferroelectric domain walls is attracting more and more attention for their potential application as an independent nanoelectronic component. For the (001) epitaxial BiFeO3 films, we find that the domain wall conductivity varies among 71 degrees domain walls, with tail-to-tail (T-T) domain walls more conductive than head-to-head (H-H) and head-to-tail (H-T) ones. Furthermore, it is observed that most of the conductive areas are composed of two parallel lines around the T-T domain walls. These experimental results can be well simulated by our theoretical model based on the polarization configuration and a tunneling mechanism. Our work will help to understand the mechanism of domain wall conductance in ferroelectric materials and further promote the usage of domain walls in advanced nano-devices. Published by AIP Publishing.en_US
dc.language.isoen_USen_US
dc.titleConductive tail-to-tail domain walls in epitaxial BiFeO3 filmsen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.5045721en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume113en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000442615500029en_US
dc.citation.woscount0en_US
顯示於類別:期刊論文