標題: | Characteristics of flexible and transparent Eu2O3 resistive switching memory at high bending condition |
作者: | Aluguri, R. Sailesh, R. Kumar, D. Tseng, Tseung-Yuen 材料科學與工程學系 電子工程學系及電子研究所 Department of Materials Science and Engineering Department of Electronics Engineering and Institute of Electronics |
關鍵字: | flexible and transparent RRAM;Poole-Frenkel conduction;high on/off ratio;bending |
公開日期: | 25-一月-2019 |
摘要: | The characteristics of ITO/Eu2O3/ITO/PET transparent and flexible resistive switching memory are studied. The device exhibits superior characteristics such as device area-independent and forming-free resistive switching behavior with a resistance on/off ratio of 10(4), good retention of >10(4) s and high AC endurance of >10(7) cycles. The conduction mechanism of the high-resistance state is the Poole-Frenkel mechanism, while that of the low-resistance state is ohmic conduction. The electrical characteristics of the flexible device have shown excellent results up to 5 mm bending radius, at which a degradation in the on/off ratio of the memory window is observed, due to the change in the dielectric layer resistance. The resistive switching characteristics can be improved during bending up to the radius of 2 mm by the incorporation of an aluminum-doped zinc oxide layer in the device as the bottom electrode, proving its application in future flexible and transparent memory devices. |
URI: | http://dx.doi.org/10.1088/1361-6528/aae670 http://hdl.handle.net/11536/148494 |
ISSN: | 0957-4484 |
DOI: | 10.1088/1361-6528/aae670 |
期刊: | NANOTECHNOLOGY |
Volume: | 30 |
顯示於類別: | 期刊論文 |