標題: | Design, Modeling, and Fabrication of High-Speed VCSEL with Data Rate up to 50 Gb/s |
作者: | Shen, Chih-Chiang Hsu, Tsung-Chi Yeh, Yen-Wei Kang, Chieh-Yu Lu, Yun-Ting Lin, Hon-Way Tseng, Hsien-Yao Chen, Yu-Tzu Chen, Cheng-Yuan Lin, Chien-Chung Wu, Chao-Hsin Lee, Po-Tsung Sheng, Yang Chiu, Ching-Hsueh Kuo, Hao-Chung 交大名義發表 光電系統研究所 光電工程學系 National Chiao Tung University Institute of Photonic System Department of Photonics |
關鍵字: | High-speed VCSEL;PICS3D;50 Gb;s;Oxide aperture;Cavity length |
公開日期: | 14-八月-2019 |
摘要: | We have studied the characteristics of frequency response at 850-nm GaAs high-speed vertical-cavity surface-emitting lasers (VCSELs) with different kinds of oxide aperture sizes and cavity length using the PICS3D simulation program. Using 5-mu m oxide aperture sizes, the frequency response behavior can be improved from 18.4 GHz and 15.5 GHz to 21.2 GHz and 19 GHz in a maximum of 3 dB at 25 degrees C and 85 degrees C, respectively. Numerical simulation results also suggest that the frequency response performances improved from 21.2 GHz and 19 GHz to 30.5 GHz and 24.5 GHz in a maximum of 3 dB at 25 degrees C and 85 degrees C due to the reduction of cavity length from 3 lambda/2 to lambda/2. Consequently, the high-speed VCSEL devices were fabricated on a modified structure and exhibited 50-Gb/s data rate at 85 degrees C. |
URI: | http://dx.doi.org/10.1186/s11671-019-3107-7 http://hdl.handle.net/11536/152631 |
ISSN: | 1931-7573 |
DOI: | 10.1186/s11671-019-3107-7 |
期刊: | NANOSCALE RESEARCH LETTERS |
Volume: | 14 |
Issue: | 1 |
起始頁: | 0 |
結束頁: | 0 |
顯示於類別: | 期刊論文 |