标题: | Indium Diffusion Behavior and Application in HfO2-Based Conductive Bridge Random Access Memory |
作者: | Zheng, Hao-Xuan Shih, Chih-Cheng Chang, Ting-Chang Shih, Lin-Yi Shih, Yao-Kai Tseng, Yi-Ting Chen, Wen-Chung Huang, Wei-Chen Yang, Chih-Cheng Wu, Pei-Yu Huang, Hui-Chun Tsai, Tsung-Ming Sze, Simon M. 电子工程学系及电子研究所 Department of Electronics Engineering and Institute of Electronics |
关键字: | complementary resistive switching;conductive bridge random access memory;indium;resistive random access memory |
公开日期: | 1-一月-1970 |
摘要: | This study proposes the design of conductive bridge random access memory (CBRAM) using an indium electrode, which diffuses into hafnium oxide. The device is found to exhibit good operating characteristics, maintaining a large operation window, low set and reset voltages, and advantageous operation speed, thereby reducing operating power consumption. Electrical experiments, transmission electron microscopy, and energy-dispersive spectroscopy confirm that the device exhibits the characteristics of a CBRAM device. In addition, due to the large operation window of this In electrode device, a combination of two of these CBRAM can act as a complementary resistive switching (CRS) device with a large memory window. |
URI: | http://dx.doi.org/10.1002/pssr.201900285 http://hdl.handle.net/11536/152633 |
ISSN: | 1862-6254 |
DOI: | 10.1002/pssr.201900285 |
期刊: | PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS |
起始页: | 0 |
结束页: | 0 |
显示于类别: | Articles |