標題: Indium Diffusion Behavior and Application in HfO2-Based Conductive Bridge Random Access Memory
作者: Zheng, Hao-Xuan
Shih, Chih-Cheng
Chang, Ting-Chang
Shih, Lin-Yi
Shih, Yao-Kai
Tseng, Yi-Ting
Chen, Wen-Chung
Huang, Wei-Chen
Yang, Chih-Cheng
Wu, Pei-Yu
Huang, Hui-Chun
Tsai, Tsung-Ming
Sze, Simon M.
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: complementary resistive switching;conductive bridge random access memory;indium;resistive random access memory
公開日期: 1-一月-1970
摘要: This study proposes the design of conductive bridge random access memory (CBRAM) using an indium electrode, which diffuses into hafnium oxide. The device is found to exhibit good operating characteristics, maintaining a large operation window, low set and reset voltages, and advantageous operation speed, thereby reducing operating power consumption. Electrical experiments, transmission electron microscopy, and energy-dispersive spectroscopy confirm that the device exhibits the characteristics of a CBRAM device. In addition, due to the large operation window of this In electrode device, a combination of two of these CBRAM can act as a complementary resistive switching (CRS) device with a large memory window.
URI: http://dx.doi.org/10.1002/pssr.201900285
http://hdl.handle.net/11536/152633
ISSN: 1862-6254
DOI: 10.1002/pssr.201900285
期刊: PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS
起始頁: 0
結束頁: 0
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