標題: Bipolar resistive switching characteristics of tungsten-doped indium-zinc oxide conductive-bridging random access memory
作者: Gan, Kai-Jhih
Liu, Po-Tsun
Lin, Sheng-Jie
Ruan, Dun-Bao
Chien, Ta-Chun
Chiu, Yu-Chuan
Sze, Simon M.
電子工程學系及電子研究所
光電工程學系
Department of Electronics Engineering and Institute of Electronics
Department of Photonics
關鍵字: Indium-tungsten-zinc-oxide;Non-volatile memories (NVM);Conductive-bridging random access memory (CBRAM);Physical vapor deposition
公開日期: 1-八月-2019
摘要: The purpose of this work is to develop a reliable amorphous tungsten-doped indium-zinc oxide based conductive-bridging random access memory (CBRAM). The device with Cu/TiW/InWZnO/Pt structure exhibits stable bipolar resistive switching behavior. The device also shows good non-volatile memory characteristics, such as low operation voltage, on/off resistance ratio (similar to 10(2)), high switching endurance (more than 5 x 10(2) cycles). The temperature coefficient of resistance in the conductive filament confirms that an electro-chemical metallization (ECM) based conduction is observed in the InWZnO device. Furthermore, the temperature retention characteristics and the current transport mechanisms are also investigated. According to our experiments, we propose a model to explain the resistive switching phenomenon observed in our devices. These results have given a great potential for the transparent amorphous oxide semiconductor (TAOS)-based material utilizing in CBRAM stacks and integrating into the display circuits for future memory-in-pixel applications.
URI: http://dx.doi.org/10.1016/j.vacuum.2019.05.023
http://hdl.handle.net/11536/152823
ISSN: 0042-207X
DOI: 10.1016/j.vacuum.2019.05.023
期刊: VACUUM
Volume: 166
起始頁: 226
結束頁: 230
顯示於類別:期刊論文