| 標題: | Bipolar resistive switching characteristics of tungsten-doped indium-zinc oxide conductive-bridging random access memory |
| 作者: | Gan, Kai-Jhih Liu, Po-Tsun Lin, Sheng-Jie Ruan, Dun-Bao Chien, Ta-Chun Chiu, Yu-Chuan Sze, Simon M. 電子工程學系及電子研究所 光電工程學系 Department of Electronics Engineering and Institute of Electronics Department of Photonics |
| 關鍵字: | Indium-tungsten-zinc-oxide;Non-volatile memories (NVM);Conductive-bridging random access memory (CBRAM);Physical vapor deposition |
| 公開日期: | 1-Aug-2019 |
| 摘要: | The purpose of this work is to develop a reliable amorphous tungsten-doped indium-zinc oxide based conductive-bridging random access memory (CBRAM). The device with Cu/TiW/InWZnO/Pt structure exhibits stable bipolar resistive switching behavior. The device also shows good non-volatile memory characteristics, such as low operation voltage, on/off resistance ratio (similar to 10(2)), high switching endurance (more than 5 x 10(2) cycles). The temperature coefficient of resistance in the conductive filament confirms that an electro-chemical metallization (ECM) based conduction is observed in the InWZnO device. Furthermore, the temperature retention characteristics and the current transport mechanisms are also investigated. According to our experiments, we propose a model to explain the resistive switching phenomenon observed in our devices. These results have given a great potential for the transparent amorphous oxide semiconductor (TAOS)-based material utilizing in CBRAM stacks and integrating into the display circuits for future memory-in-pixel applications. |
| URI: | http://dx.doi.org/10.1016/j.vacuum.2019.05.023 http://hdl.handle.net/11536/152823 |
| ISSN: | 0042-207X |
| DOI: | 10.1016/j.vacuum.2019.05.023 |
| 期刊: | VACUUM |
| Volume: | 166 |
| 起始頁: | 226 |
| 結束頁: | 230 |
| Appears in Collections: | Articles |

