標題: | Effect of Top Electrode Material on Resistive Switching Characteristics in MnO2 Nonvolatile Memory Devices |
作者: | Tsai, Yu-Ting Chang, Ting-Chang Lin, Chao-Cheng Chiang, Lan-Shin Chen, Shih-Cheng Sze, Simon M. Tseng, Tseung-Yuen 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
公開日期: | 2011 |
摘要: | The influence of top electrode material on the resistive switching properties of MnO2-based memory film using Pt as a bottom electrode was investigated in this study. In comparison with Pt/MnO2/Pt and Al/ MnO2/Pt devices, the Ti/ MnO2/Pt device exhibits resistive switching current-voltage (I-V) curve, which can be traced and reproduced more than 10(5) times only showing a little decrease of resistance ratio between high and low resistance states. Furthermore, transmission electron microscopy analyses are used to confirm the crystalline structure of MnO2 on Pt bottom electrode. Secondary ion mass spectrometry reveals a change of oxygen distribution in MnO2 thin film due to material characteristic of variant top electrodes. We suggest that the interface between MnO2 and electrodes play an important role on the resistive switching behaviors. |
URI: | http://hdl.handle.net/11536/16236 |
ISBN: | 978-1-60768-257-8 |
ISSN: | 1938-5862 |
期刊: | PHYSICS AND TECHNOLOGY OF HIGH-K MATERIALS 9 |
Volume: | 41 |
Issue: | 3 |
結束頁: | 475 |
顯示於類別: | 會議論文 |