標題: | Achieving High Field-Effect Mobility in Amorphous Indium-Gallium-Zinc Oxide by Capping a Strong Reduction Layer |
作者: | Zan, Hsiao-Wen Yeh, Chun-Cheng Meng, Hsin-Fei Tsai, Chuang-Chuang Chen, Liang-Hao 物理研究所 光電工程學系 Institute of Physics Department of Photonics |
關鍵字: | high mobility;oxide semiconductors;thin film transistors;defect reduction;oxygen deficiency |
公開日期: | 10-Jul-2012 |
URI: | http://hdl.handle.net/11536/16435 |
ISSN: | 0935-9648 |
期刊: | ADVANCED MATERIALS |
Volume: | 24 |
Issue: | 26 |
結束頁: | 3509 |
Appears in Collections: | Articles |
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