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dc.contributor.authorWy, Zheng-Yuen_US
dc.contributor.authorKim, Sung-Oen_US
dc.date.accessioned2014-12-08T15:24:58Z-
dc.date.available2014-12-08T15:24:58Z-
dc.date.issued2006en_US
dc.identifier.urihttp://hdl.handle.net/11536/17355-
dc.description.abstractMicroplasma devices with nano-tip electrodes have been fabricated and operated successfully in Ar and Ne gases. The nano-tip locally enhances the electronic field. Current-voltage characteristics of microplasma devices have been examined by direct current bipolar pulsed waveform with different frequencies from 2 to 20 kHz in 300 - 800 Torr of Ar, Ne and Ne+Ar(2%). With all the advantages, the nano-tip enhanced microplasma technology provides possible opportunity to integrate to flat plasma light source.en_US
dc.language.isoen_USen_US
dc.titleMicroplasma devices with nano-tip enhanced electrodes operated in Ar and Ne gases for plasma light source applicationen_US
dc.typeProceedings Paperen_US
dc.identifier.journalIDW '06: PROCEEDINGS OF THE 13TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3en_US
dc.citation.spage1731en_US
dc.citation.epage1733en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000258482700447-
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