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dc.contributor.authorYang, Che-Yuen_US
dc.contributor.authorWu, Yung-Chunen_US
dc.contributor.authorChang, Ting-Changen_US
dc.contributor.authorLiu, Po-Tsunen_US
dc.contributor.authorChen, Chi-Shenen_US
dc.contributor.authorTu, Chun-Haoen_US
dc.contributor.authorChang, Chun-Yenen_US
dc.date.accessioned2014-12-08T15:25:30Z-
dc.date.available2014-12-08T15:25:30Z-
dc.date.issued2005en_US
dc.identifier.isbn978-957-28522-2-4en_US
dc.identifier.urihttp://hdl.handle.net/11536/17905-
dc.description.abstractWe have investigated the temperature dependent electrical characteristics of lightly-doped drain (LDD) polysilicon thin-film transistors (poly-Si TFTs) with a series of multi-channel with different widths from 25 degrees C to 175 degrees C. The ten 67 nm-wide spilt channels TFT has best transfer characteristics, because of its robust trigate control and grain boundary defects is the lowest, due to its split nan-wires structure with effective NH3 plasma passivation.en_US
dc.language.isoen_USen_US
dc.titleTemperature dependence of thin-film transistors electrical characteristics with multiple nano-wire channelsen_US
dc.typeProceedings Paperen_US
dc.identifier.journalIDMC 05: PROCEEDINGS OF THE INTERNATIONAL DISPLAY MANUFACTURING CONFERENCE 2005en_US
dc.citation.spage500en_US
dc.citation.epage502en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000259399200137-
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