| 標題: | AlSixOy as a high transmittance embedded material for AttPSM and the correlation between the chemical compositions and optical properties of AlSixOy in 193 nm lithography |
| 作者: | Lin, CM 應用化學系 Department of Applied Chemistry |
| 公開日期: | 2000 |
| URI: | http://hdl.handle.net/11536/19309 |
| ISBN: | 4-89114-004-6 |
| 期刊: | MICROPROCESSES AND NANOTECHNOLOGY 2000, DIGEST OF PAPERS |
| 起始頁: | 12 |
| 結束頁: | 13 |
| 顯示於類別： | 會議論文 |
- 193奈米微影用正規與高透射率嵌附層材料之探討及減光型相移圖罩應用之模擬 / 林政旻;Cheng-ming Lin;龍文安;Dr. Loong Wen-an
- AlSixOy as a high-transmittance embedded material of ternary attenuated phase-shifting mask and correlation between chemical composition and optical properties of AlSixOy in 193 nm lithography / Lin, CM;Loong, WA
- TiSixNy and TiSixOyNz as embedded materials for attenuated phase-shifting mask in 193 nm / Lin, CM;Loong, WA
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