標題: | A comparative study of SILC transient characteristics and mechanisms in FN stressed and hot hole stressed tunnel oxides |
作者: | Zous, NK Wang, TH Yeh, CC Tsai, CW Huang, CM 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
公開日期: | 1999 |
摘要: | The mechanisms and transient characteristics of hot hole stress and FN stress induced excess leakage currents in tunnel oxides are investigated. Hot hole SILC is found to have a more pronounced transient effect. The transient is attributed to positive oxide charge detrapping and thus annihilation of positive charge-assisted tunneling current. The positive charge assisted tunneling current can be annealed by substrate hot electron injection. The DC and transient components in FN SILC are also discussed. |
URI: | http://hdl.handle.net/11536/19395 http://dx.doi.org/10.1109/RELPHY.1999.761647 |
ISBN: | 0-7803-5220-3 |
DOI: | 10.1109/RELPHY.1999.761647 |
期刊: | 1999 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM PROCEEDINGS - 37TH ANNUAL |
起始頁: | 405 |
結束頁: | 409 |
Appears in Collections: | Conferences Paper |
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