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dc.contributor.authorChang, Yao-Fengen_US
dc.contributor.authorChang, Ting-Changen_US
dc.contributor.authorChang, Chun-Yenen_US
dc.date.accessioned2014-12-08T15:27:17Z-
dc.date.available2014-12-08T15:27:17Z-
dc.date.issued2011-09-01en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.3630119en_US
dc.identifier.urihttp://hdl.handle.net/11536/19526-
dc.description.abstractWe investigated multilevel resistance switching characteristics of the thin FeO(x) transition layer in a TiN/SiO(2)/FeO(x)/Fe structure by controlling the current compliance and stopped voltage during the set and reset processes, respectively. It is observed that the resistive state could be easily tunable by controlling external electric conditions. The multilevel memristive mechanism was characterized by distinguishing the electrical behaviors statistically, inferring that the reset process is associated with the mobile-ion-assisted electrochemical redox. Moreover, the set process is also modeled by power dissipation behaviors. The presented mathematical and physical model provides a possibility to elucidate a universal mechanism for bipolar multilevel memristor. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3630119]en_US
dc.language.isoen_USen_US
dc.titleInvestigation statistics of bipolar multilevel memristive mechanism and characterizations in a thin FeO(x) transition layer of TiN/SiO(2)/FeO(x)/Fe structureen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1063/1.3630119en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume110en_US
dc.citation.issue5en_US
dc.citation.epageen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000294968600066-
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