標題: Mechanisms and characteristics of oxide charge detrapping in n-MOSFET's
作者: Wang, TH
Chang, TE
Chiang, LP
Huang, CM
Guo, JC
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
公開日期: 1996
URI: http://hdl.handle.net/11536/19878
ISBN: 0-7803-3343-8
期刊: 1996 SYMPOSIUM ON VLSI TECHNOLOGY: DIGEST OF TECHNICAL PAPERS
起始頁: 232
結束頁: 233
Appears in Collections:Conferences Paper