標題: | Mechanisms and characteristics of oxide charge detrapping in n-MOSFET's |
作者: | Wang, TH Chang, TE Chiang, LP Huang, CM Guo, JC 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
公開日期: | 1996 |
URI: | http://hdl.handle.net/11536/19878 |
ISBN: | 0-7803-3343-8 |
期刊: | 1996 SYMPOSIUM ON VLSI TECHNOLOGY: DIGEST OF TECHNICAL PAPERS |
起始頁: | 232 |
結束頁: | 233 |
Appears in Collections: | Conferences Paper |