標題: | SIMULATION STUDY OF A NEW PHASE-SHIFTING MASK - HALFTONE-RIM |
作者: | LOONG, WA YEH, CH SHY, SL 應用化學系 Department of Applied Chemistry |
關鍵字: | PHASE-SHIFTING MASK;HALF-TONE;RIM;HALF-TONE-RIM;SIMULATION;OFF-AXIS ILLUMINATION;SUBMICRON LITHOGRAPHY |
公開日期: | 1995 |
URI: | http://hdl.handle.net/11536/19976 http://dx.doi.org/10.1117/12.209275 |
ISBN: | 0-8194-1788-2 |
DOI: | 10.1117/12.209275 |
期刊: | OPTICAL/LASER MICROLITHOGRAPHY VIII |
Volume: | 2440 |
起始頁: | 448 |
結束頁: | 457 |
Appears in Collections: | Conferences Paper |
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